3-zone Flow Ratio Controller
For Process Optimization of Critical Deposition and Etch Processes

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The DELTA III Flow Ratio Controller is a critical process control instrument in the MKS line of digital control, web-browser products. Available with EtherCAT® or DeviceNet™ communications, this device provides the latest in gas flow ratio measurement and control technology necessary to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity control.

The DELTA series mass flow ratio controllers divide and control mixed process gas flows to either multiple chambers or zones within a process chamber at proportions specified by the user to optimize process uniformity and repeatability. The DELTA series flow ratio controllers with their superior performance and compact design are the latest offerings from MKS's industry leading DELTA controllers enabling process gas flow ratio control.

Features & Benefits:

  • Accurate & repeatable flow ratio control for better process optimization
  • Control flow proportion independent of the process gas mix
  • Digital control loop for rapid response to channel set point
  • Increase tool uptime with fewer "No Problem Found" product replacements
  • Embedded diagnostics and software to check functionality without removal
  • E-diagnostics with embedded Ethernet interface for monitoring performance during operation
  • Uses standard web browser - no special software required


DELTA III mass flow ratio controller is used in a variety of flow splitting applications such as etch, strip, and CVD.

DELTA III Gallery:
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photo - DELTA III Schematic Diagram - DELTA III Controlling 3 Zones Screen Capture - DELTA III 3-zone Performance


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Part NumberPriceQTY
DELTA™III 3-zone Flow Ratio ControllerQuote Only

Need help?

Contact an Applications Specialist by sending an email to MKS Instruments, or call 978-645-5500.