R*evolution® V AX7696MKS-01
Remote Plasma Source (10 slm Oxygen flow)
Intelligent Process Control for On-wafer Processing
The innovative R*evolution® V combines field-proven, low-field toroidal plasma technology, intelligent communications, and true power control capabilities. The R*evolution series remote plasma source leads the way in oxygen radical-based applications such as photoresist strip and other surface preparation.
The R*evolution® V remote plasma source integrates a uniquely designed, actively cooled quartz torus plasma chamber, an RF power supply, intelligent power control, and EtherCAT® diagnostics into a compact, self-contained unit for easy installation directly on the tool's process chamber. Delivering up to 10 slm radicals, delivery is controlled with true power accuracy <1% to support the latest equipment supplier requirements in chamber matching.