The innovative R*evolution® V combines field-proven, low-field toroidal plasma technology, intelligent communications, and true power control capabilities. The R*evolution series remote plasma source leads the way in oxygen radical-based applications such as photoresist strip and other surface preparation. The R*evolution® V remote plasma source integrates a uniquely designed, actively cooled quartz torus plasma chamber, an RF power supply, intelligent power control, and EtherCAT® diagnostics into a compact, self-contained unit for easy installation directly on the tool's process chamber. Delivering up to 10 slm radicals, delivery is controlled with true power accuracy <1% to support the latest equipment supplier requirements in chamber matching. The R*evolution® V remote plasma source provides high-performance oxygen radical delivery to the wafer, resulting in an extremely clean source and lower cost of ownership. The R*evolution® V EtherCAT® communication protocol permits near real-time data reporting of critical plasma source operating parameters to the process tool or fab network. EtherCAT® can be used for direct control of the R*evolution® V, or in combination with the analog port, as a data monitoring port only. The R*evolution® V streams intelligent data sets to the tool or fab database to monitor or modify operating parameters to keep process tools running at peak efficiency and to support diagnostic (APC/FDC) applications.