The R*evolution V remote plasma source integrates a uniquely designed, actively cooled quartz torus plasma chamber, an RF power supply, intelligent power control, and EtherCAT® diagnostics into a compact, self-contained unit for easy installation directly on the tool’s process chamber. Delivering up to 10 slm radicals, delivery is controlled with true power accuracy < 1% to support the latest equipment supplier requirements in chamber matching.
The R*evolution V EtherCAT communication protocol permits near real-time data reporting of critical plasma source operating parameters to the process tool or fab network. EtherCAT can be used for direct control of the R*evolution V, or in combination with the analog port, as a data monitoring port only. The R*evolution V streams intelligent data sets to the tool or fab database to monitor or modify operating parameters to keep process tools running at peak efficiency and to support diagnostic (APC/FDC) applications.