Remote Plasma Sources

MKS designs and manufactures RF torroidal plasma sources to energize and dissociate gases. Fluorine based gases such as NF3 are used to clean unwanted deposits from the walls of vacuum process chambers. Plasma sources for process chemistries include oxygen, nitrogen, and hydrogen.

Product Catalog

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Literature:

MKS Plasma Source Product Line
New: MKS Toroidal Plasma Sources Operation with Hydrogen

Need help?

Contact an Applications Specialist by sending an email to MKS Instruments or call 978-284-4000.