Critical to the process of semiconductor fabrication is introducing small amounts of dopants at exact locations in controlled concentrations. This gives the semiconductor its required electrical properties. Diffusion is the movement of impurity atoms in silicon (or another semiconductor) at high temperature. Basically, diffusion can be described as a "smoothing out" of any localized high concentration of impurity atoms that is driven by the motion of the atoms in the material and by their mobility through the dominant atomic matrix.
MKS is as OEM supplier for producers of thermal processing products used in the semiconductor industry.
Dopant Atom Diffusion
A detailed explanation of the thermal dopant atom diffusion process
Thermal Oxidation
Thermal oxides can be grown using a "dry" oxidation process
Thermal Annealing
High-temperature annealing is used in device manufacturing to relieve stress in silicon
Remote Plasma Sources for Clean Applications
For cleaning CVD and ALD/ALE process chambers
Microwave Generators & Systems
Compact microwave generators and systems adaptable to a wide range of applications
Mass Flow Controllers & Meters
Application-specific integrated solutions for advanced materials delivery
Baratron® Capacitance Manometers
For direct, gas independent, high accuracy pressure measurement