Vision 2000-C XD
Vision 2000-E XD
High Sensitivity RGAs for Multi-pressure & CVD/ALD

Vision 2000-C XD & Vision 2000-E XD High Sensitivity RGAs for Multi-pressure & CVD/ALD - click to enlarge
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The Vision 2000-C XD and Vision 2000-E XD systems incorporate patented V-lens technology, taking the proven performance of the Vision 2000-C and Vision 2000-E systems to a new level of sensitivity and reliability, previously unachievable with conventional quadrupole mass spectrometry systems.

The patented V-lens design provides increased sensitivity (<15ppb specified with Argon or Nitrogen) and reproducibility for the most challenging applications; such as tracking levels of various gas species during etch processes and the chamber clean, passivation sequences, and deposition steps for various ALD, CVD, and Etch processes.

V-lens overcomes the issues faced with challenging gases (such as Argon) that limit the detection power of conventional systems. In combination with the "smart head" RGA technology of the Microvision 2, closed ion source and close-coupled inlet, this configuration enables sensitive, reproducible and seamless monitoring of the most challenging ALD, CVD, and Etch applications.

Features & Benefits:

  • V-lens technology provides:
    Lower detection limits - increased sensitivity up to 10 times improvement at lower masses (<15ppb)
    Higher data quality - more reliable distinction between gases and background
    Cleaner baseline - lower noise across the mass scale
  • Application-specific RGA designed for continuous in situ monitoring of ALD, CVD, and etching processes
    In situ monitoring during chamber clean, passivation and deposition to detect subtle changes in low concentration species and high mass species decay with respect to time
    Ideal for qualification of new ALD, CVD, or Etch process tools or process sequences
    Enables precision end-point characterization and process optimization
    Provides insight into etch rate variations
    Decreases time to production and time to ramp
  • TOOLweb® RGA software for automated control and monitoring of semiconductor tools
  • Baseline monitoring of ALD, CVD, or Etch chambers for air leaks and background contamination levels
  • Integration with a range of ALD, CVD, and Etch tools

Configurations:

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Part NumberPriceQTY
Vision 2000-C/E XD High Sensitivity RGAsQuote Only

Need help?

Contact an Applications Specialist by sending an email to MKS Instruments or call 408-750-0300.