Intelligent Remote Plasma Source
(8 slm, NF3 flow)
Building on the production-proven attributes of the MKS low-field toroidal plasma source, the Paragon® remote plasma source offers improved data transfer and control to enable the next generation of nano process development and manufacturing.
For cleaning CVD and ALD/ALE process chambers, the Paragon remote plasma source is designed for high gas dissociation rates (>98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. This leading-edge performance translates into increased process throughput and repeatable process results. The Paragon® remote plasma source design incorporates a proprietary plasma block design with a Plasma Electrolytic Oxidation coating for low particle, long block life that delivers lower cost of ownership.