Paragon® H* AX7780/AX7785
Remote Plasma Gas Generators for Hydrogen-based Processes

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Building on production proven attributes of Paragon® reactive gas generators, Paragon® H* is designed with new features and enhancements to enable CVD, PVD, and ALD applications in Hydrogen based processes.

The Paragon H* reactive gas generator is designed for Hydrogen flows up to 5 slm and pressures up to 3 Torr enabling process flexibility, decreased processing times and increased throughput. Based on the MKS patented Low-Field-Toroidal plasma technology, Paragon H* incorporates an enhanced plasma block for improved Hydrogen radical output.

Features & Benefits:

  • Up to 5 slm H2 for hydrogen radicalapplications
  • Enhanced ignition electronics and operating space greatly improves process flexibility
  • Optimized EtherCAT communication port for faster, streamlined device operation (optional)
  • Superior input gas distribution and optimized H2 plasma block coating for enhanced H* production

Applications:

In typical applications, the Paragon H* generates atomic Hydrogen radicals that can be used during deposition or etch processes. Using a remote plasma source as opposed to in-situ plasma generation also eliminates direct exposure to energetic ions for on-wafer applications, and limits wear and tear on process chamber components.

Configurations:

Purchase now or request a quote:
Enter a quantity and click "add to cart"

Part NumberDescriptionPriceQTY
AX7780standard DB25 communication portQuote Only
AX7785EtherCAT communication portQuote Only

Need help?

Contact an Applications Specialist by sending an email to MKS Instruments or call 978-284-4000.