HA-MFV, High Accuracy Mass Flow Verifier
Enables "Wafer-to-Wafer" "Chamber-to-Chamber" & "Tool-to-Tool" Matching

HA-MFV, High Accuracy Mass Flow Verifier - click to enlarge
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HA-MFV, High Accuracy Mass Flow Verifier is designed for use on process tools to verify mass flow control flow rates in-situ. With measurement accuracy of 1.0% of reading, the HA-MFV can verify MFC flow with the actual process gas significantly better than older rate-of-rise devices or process chamber rate-of rise methods.

HA-MFV is more accurate and is insensitive to external volume (from MFC to the HA-MFV) and variation, delivering more precise matching of measurements between devices on multiple tools for the same process, assuring precise tool-to-tool process matching.

HA-MFV Functional Diagram

Features & Benefits:

  • 1.0% or better measurement accuracy for wafer-to-wafer, chamber-to-chamber, & tool-to-tool process matching
  • Supports multiple gas panels to reduce implementation costs
  • 5 to 3000 sccm measurement range for a wide variety of processes
  • In-situ assessment of MFC flow rate improves process control and avoids unneeded down-time

Applications:

HA-MFV, High Accuracy Mass Flow Verifier is designed for use in gas-based process tools requiring fast, accurate verification of mass flow controllers and meters.

Configurations:

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Documents & Downloads:

HA-MFV, High Accuracy Mass Flow Verifier data sheet
HA-MFV, High Accuracy Mass Flow Verifier specifications
HA-MFV, High Accuracy Mass Flow Verifier dimensional drawing
HA-MFV 3D STP files

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Need help?

Contact an Applications Specialist by sending an email to MKS Instruments, or call 978-645-5500.