4-zone Flow Ratio Controller
For Process Optimization of Critical Deposition and Etch Processes

DELTA IV 4-zone Flow Ratio Controller - click to enlarge
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DELTA IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument, available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control.

DELTA mass flow ratio controllers divide and control mixed process gas flows to multiple chambers or zones at user-specified proportions, optimizing process uniformity and repeatability.

Features & Benefits:

  • Accurate & repeatable flow ratio control for better process optimization
  • Control flow proportion independent of the process gas mix
  • Digital control loop for rapid response to channel set point
  • Increase tool uptime with fewer "No Problem Found" product replacements
  • Embedded diagnostics and software to check functionality without removal
  • E-diagnostics with embedded Ethernet interface for monitoring performance during operation
  • Uses standard web browser - no special software required


DELTA IV mass flow ratio controller is used in a variety of flow splitting applications such as etch, strip, and CVD.

DELTA IV Gallery:
   (click image to enlarge)

thumbnail photo - DELTA IV diagram - DELTA IV Dual Chamber Configuration diagram - DELTA IV 4-zone Configuration screen capture - DELTA IV 4-zone Performance


Purchase now or request a quote:
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Part NumberPriceQTY
DELTA™ IV 4-zone Flow Ratio ControllerQuote Only

Need help?

Contact an Applications Specialist by sending an email to MKS Instruments, or call 978-645-5500.