Plasma Sources for NF3 and Fluorine-based Gases

photo - ASTRON� Paragon� AX7700/AX7710 Remote Plasma Generator

Plasma sources for NF3 and fluorine-based gases are a remote source for reactive gas to clean undesired deposits from interior walls of thin film deposition process chambers. By generating atomic fluorine that reacts with waste deposits in the chamber, new gases are formed that are readily scrubbed to minimize the environmental impact. In addition, the remote source reduces wear and tear on the process chamber as compared to in-situ RF methods.