Plasma Sources for O2, N2, H2, H2O

Plasma is an ionized gas essential in many processes such as photo-resist removal, wafer pre-clean, and thin film nitridation and oxidation. MKS designs and develops RF and microwave powered remote and in-situ sources for generation of oxygen, nitrogen, hydrogen and water vapor plasmas.

Need help?

Contact an Applications Specialist by sending an email to MKS Instruments or call 978-284-4000.