Vision 2000-C™ XD
Vision 2000-E™ XD
High Sensitivity RGAs for Multi-pressure & CVD/ALD
The Vision 2000-C™ XD and Vision 2000-E™ XD systems incorporate patented V-lens™ technology, taking the proven performance of the Vision 2000-C™ and Vision 2000-E™ systems to a new level of sensitivity and reliability, previously unachievable with conventional quadrupole mass spectrometry systems.
The patented V-lens™ design provides increased sensitivity (<15ppb specified with Argon or Nitrogen) and reproducibility for the most challenging applications; such as tracking levels of various gas species during etch processes and the chamber clean, passivation sequences, and deposition steps for various ALD, CVD, and Etch processes.
V-lens™ overcomes the issues faced with challenging gases (such as Argon) that limit the detection power of conventional systems. In combination with the "smart head" RGA technology of the Microvision 2, closed ion source and close-coupled inlet, this configuration enables sensitive, reproducible and seamless monitoring of the most challenging ALD, CVD, and Etch applications.