vision 2000-c and e rga for multi-pressure and cvd/ald processes

CVD or Etch Process Monitor, 1-200 amu, Multi-pressure & CVD/ALD

Model: VISION-2000-E

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Overview

Vision 2000-E™ 1-200 amu Residual Gas Analyzer incorporates "smart head" RGA technology with a closed ion source and close-coupled inlet. This state-of-the-art RGA technology is integrated with Process Eye™ Professional control platform, a recipe-based, user-configurable software program. The combination of closed ion source and automated inlet allows seamless 1 to 300 amu monitoring of the complete CVD or Etch process cycle.

Product Series Overview

Vision 2000-C™ & E™ RGAs for Multi-pressure & CVD/ALD Processes

Technical Specs

Mass Range

1 - 200 amu
Ion Source

High conductance closed ion source
Filaments

Twin Tungsten filaments
Mass Filter

Double filter (1 in. "RF only" pre-filter with 4 in. main filter)
Detector

Dual (Faraday and secondary electron multiplier)
Maximum Analyzer Operating Pressure

1e^-3 Torr at the ion source inlet (standard), higher pressure optional
Minimum Detectable Concentration

<200 ppb of highest pressure gas for non-interfering species
Mass Stability

Better than ±0.1 amu over 8 hours
Resolution

Better than 10% valley for peaks of equal height across mass range
Base Pressure Range

Ion source at maximum pressure at 1, 10 or 100 mTorr
Process Pressure Range

Ion source at maximum pressure at 10, 100, 500, 1.5, 5, 10, 40, 100 or 700 Torr (*Optional gas acceleration for ranges <10 Torr available. For other inlet and process pressure ranges, please consult the factory).
Mounting Flange

DN35CF (70 mm/2.75 in. OD) Conflat. Custom adapters can be provided.
Vacuum Hardware

60 l/s turbomolecular pump with high conductance analyzer housing, inlet system, UniBloc™ inlet, automated vacuum control (RVC) completely interlocked and integrated
Backing Vacuum System

Standard: Connected to the tool foreline pump via Surge Protect assembly with a KF16 fitting, Optional: Independent chemically resistant, dry diaphragm pump with KF16 fitting for connecting the exhaust to a suitable scrubber system
Analyzer Housing Base Pressure

Better than 5e^-9 Torr after bakeout
Bake Out Temperature

180°C with Bakeout Jacket
Operating Temperature

90°C (controlled to ±1°C)
Weight

33 lbs. (15 kg) to bolt on Process System
Mechanical Support

Optional stands and brackets are available

Mobile RGA Platform

Optional RGA trolley to improve versatility (footprint 18 x 24 in., 455 x 604 mm)
Pneumatics

60-80 psig CDA
Electronics Weight on Flange

1.7 kg
Power Requirements

88 - 264 VAC, 47/63 Hz, 600 W
Maximum Operating Conditions

Electronics: 10 - 40°C, 80% RH (non condensing)
LED Status Indication

Interlock status, filament emission, SEM, power and communications
I/O Capability

4 analog inputs and 2 outputs (plus 1 dedicated gauge input). Optional support for a large number of both analog and digital inputs and outputs, including relay control
Other Facilities

Leak check headset socket, external filament trip socket, instrument reset
Software

Process Eye Professional fully network compatible control platform generating under 32 bit or 64 bit Microsoft Windows XP, Vista, Server 2008 or Windows 7
Communication

Ethernet CAT-5e
PC Requirements

Intel Pentium IV or AMD Athlon XP 1.2 GHz, 1GB RAM, 120 GB hard drive, dependent upon total number of sensors on the computer and the operating system in use. Multi-sensor installation may require higher specifications.
Simultaneous Multi-Sensor

Process Eye Professional client/server configuration offers flexible multi-sensor operation.
RGA to Vacuum System Cable Length

33 ft. (10 m) standard RGA and 10 ft. (3 m) with mobile RGA platform. Other lengths available dependent upon process system and customer requirements
Shipping Weight

44 lbs (20 kg) may vary depending upon backing pump and instrument rack requirements
Type

Residual Gas Analyzer
Measurement Technique

Mass Spectrometry
Compliance

Compliant to RoHS Directive 2002/95/EC (control unit)

Technical Specs

Mass Range

1 - 200 amu
Ion Source

High conductance closed ion source
Filaments

Twin Tungsten filaments
Mass Filter

Double filter (1 in. "RF only" pre-filter with 4 in. main filter)
Detector

Dual (Faraday and secondary electron multiplier)
Maximum Analyzer Operating Pressure

1e^-3 Torr at the ion source inlet (standard), higher pressure optional
Minimum Detectable Concentration

<200 ppb of highest pressure gas for non-interfering species
Mass Stability

Better than ±0.1 amu over 8 hours
Resolution

Better than 10% valley for peaks of equal height across mass range
Base Pressure Range

Ion source at maximum pressure at 1, 10 or 100 mTorr
Process Pressure Range

Ion source at maximum pressure at 10, 100, 500, 1.5, 5, 10, 40, 100 or 700 Torr (*Optional gas acceleration for ranges <10 Torr available. For other inlet and process pressure ranges, please consult the factory).
Mounting Flange

DN35CF (70 mm/2.75 in. OD) Conflat. Custom adapters can be provided.
Vacuum Hardware

60 l/s turbomolecular pump with high conductance analyzer housing, inlet system, UniBloc™ inlet, automated vacuum control (RVC) completely interlocked and integrated
Backing Vacuum System

Standard: Connected to the tool foreline pump via Surge Protect assembly with a KF16 fitting, Optional: Independent chemically resistant, dry diaphragm pump with KF16 fitting for connecting the exhaust to a suitable scrubber system
Analyzer Housing Base Pressure

Better than 5e^-9 Torr after bakeout
Bake Out Temperature

180°C with Bakeout Jacket
Operating Temperature

90°C (controlled to ±1°C)
Weight

33 lbs. (15 kg) to bolt on Process System
Mechanical Support

Optional stands and brackets are available

Mobile RGA Platform

Optional RGA trolley to improve versatility (footprint 18 x 24 in., 455 x 604 mm)
Pneumatics

60-80 psig CDA
Electronics Weight on Flange

1.7 kg
Power Requirements

88 - 264 VAC, 47/63 Hz, 600 W
Maximum Operating Conditions

Electronics: 10 - 40°C, 80% RH (non condensing)
LED Status Indication

Interlock status, filament emission, SEM, power and communications
I/O Capability

4 analog inputs and 2 outputs (plus 1 dedicated gauge input). Optional support for a large number of both analog and digital inputs and outputs, including relay control
Other Facilities

Leak check headset socket, external filament trip socket, instrument reset
Software

Process Eye Professional fully network compatible control platform generating under 32 bit or 64 bit Microsoft Windows XP, Vista, Server 2008 or Windows 7
Communication

Ethernet CAT-5e
PC Requirements

Intel Pentium IV or AMD Athlon XP 1.2 GHz, 1GB RAM, 120 GB hard drive, dependent upon total number of sensors on the computer and the operating system in use. Multi-sensor installation may require higher specifications.
Simultaneous Multi-Sensor

Process Eye Professional client/server configuration offers flexible multi-sensor operation.
RGA to Vacuum System Cable Length

33 ft. (10 m) standard RGA and 10 ft. (3 m) with mobile RGA platform. Other lengths available dependent upon process system and customer requirements
Shipping Weight

44 lbs (20 kg) may vary depending upon backing pump and instrument rack requirements
Type

Residual Gas Analyzer
Measurement Technique

Mass Spectrometry
Compliance

Compliant to RoHS Directive 2002/95/EC (control unit)

CVD or Etch Process Monitor, 1-200 amu, Multi-pressure & CVD/ALD

PART: VISION-2000-E

Compare

Add to List

Product Comparison

CVD or Etch Process Monitor, 1-200 amu, Multi-pressure & CVD/ALD

Model: VISION-2000-E

CVD or Etch Process Monitor, 1-200 amu, Multi-pressure & CVD/ALD

CVD or Etch Process Monitor, 1-200 amu, Multi-pressure & CVD/ALD

Model: VISION-2000-E

Overview

Overview

Product Series Overview

Technical Specs

Technical Specs

Technical Specs

PART: VISION-2000-E

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