Clean NDIR Endpoint Sensor, Process Sense™, Non-dispersive Infrared Chamber
Model: PROCESS-SENSE-NDIR
Clean NDIR Endpoint Sensor, Process Sense™, Non-dispersive Infrared Chamber
Clean NDIR Endpoint Sensor, Process Sense™, Non-dispersive Infrared Chamber
Model: PROCESS-SENSE-NDIR
Overview
Overview
The Process Sense™ endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense™ is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). The Process Sense™ gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense™, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
Technical Specs
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TypeNDIR Analyzer
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Measurement TechniqueNondispersive Infrared Sensor
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Measurement RangeSiF4 1 - 200 ppm (at 760 Torr)
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Detection Limit1 ppm SiF4 (at 760 Torr)
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Response Time1 second report rate
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Calibration Accuracy±10%
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Electrical ConnectorDB25 (DB15 adapter available)
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Power Requirements24 VDC (2 Amp)
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Dimensions38 x 12 x 13 cm (15 x 4.5 x 5 in.)
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Weight2.5 kg (5.5 lbs.)
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Analog OutputAnalog 1 (AO1): 0 - 10 V (1x SiF4 concentration), Analog 2 (AO2): 0 - 10 V (20x SiF4 concentration)
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Digital OutputFault signals
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Sample Pressure1 - 760 Torr
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Sample Temperature25 - 60°C
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FittingsNW25, NW40, NW50 (others available upon request)
Resources & Downloads
Drawings & CADs
- ProcessSense™ NDIR Dimensional Drawing (102.5 kB, PDF)
Clean NDIR Endpoint Sensor, Process Sense™, Non-dispersive Infrared Chamber
Ultra-High Velocity