O3CS Compact Ozone System
Model: O3CS
O3CS Compact Ozone System
O3CS Compact Ozone System
Model: O3CS
Overview
Overview
The O3CS compact ozone system uses Grade 6 oxygen to generate pure ozone, enabling the creation of high quality thin films for the semiconductor industry. Ozone reacts with a wide range of precursor gases to generate oxide films such as Al2O3, ZrO2, HFO2 & La2O3 via Atomic Layer Deposition (ALD).
Technical Specs
Resources & Downloads
Literature
- O3CS Compact Ozone System (369.3 kB, PDF)
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