The HMPX60S-MKS High Power Microwave Plasma System with a sapphire applicator material features a 6.0 kW Microwave Plasma Source, generator (with isolator) and auto-tuning system comprised of the Precision Power Detector and SmartMatch® unit. This comprehensive system delivers a high concentration of radicals with low electron temperatures for the highest dissociation and lowest recombination rates. With the ability to ignite in various process gases over a wide operating range within seconds, the High Power Microwave Plasma System is compatible with current and advanced applications such as photoresist removal post-HDIIS implant, advanced surface cleaning and conditioning, and advanced deposition applications.
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HMPX60S-MKS - Drawings
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HMPX60S-MKS
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Microwave Plasma System, High Power, 6.0 kW, 2,440-2,470 MHz, Sapphire