Residual Gas Analyzer, 1-200 amu, Multichannel Plate Dual Detector, Open Ion Source, Tungsten Filaments
Model: EV2-220-000FT
Residual Gas Analyzer, 1-200 amu, Multichannel Plate Dual Detector, Open Ion Source, Tungsten Filaments
Residual Gas Analyzer, 1-200 amu, Multichannel Plate Dual Detector, Open Ion Source, Tungsten Filaments
Model: EV2-220-000FT
Overview
Overview
The e-Vision 2 EV2-220-000FT is one of a new range of residual gas analysis products, from MKS Instruments, designed to meet all the traditional requirements for an RGA sensor but with data collection at speeds unachievable with previous generation technologies. It has a Multichannel Plate Dual Detector with a mass range of 1-200 amu and an open ion source. e-Vision 2 RGA is designed to provide maximum value for money, collecting data at millisecond speeds per data point even when measuring data over the full dynamic range of the RGA.
Technical Specs
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TypeResidual Gas Analyzer
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Measurement TechniqueMass Spectrometry
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Mass Range1-200 amu
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DetectorMultichannel Plate Dual
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Ion SourceOpen
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FilamentsTungsten
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SoftwareBuilt-in web application
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Filter length4 in. (100 mm)
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Maximum Analyzer Operating Pressure1e-4 Torr (1.3e-4 mbar)
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Ion Source Sensitivity2e-4 A/mbar
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Mass Stability±0.1 amu over 8 hours at stable ambient
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ResolutionBetter than 10% valley for peaks of equal height across mass range
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Bake Out Temperature250°C with electronics removed
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Operating Temperature200°C Faraday only with electronics 10 - 40°C, 150°C Multiplier with electronics 10 - 40°C and pressure <1e-8 mbar, 90°C Multiplier with electronics 10 - 40°C and pressure <1e-5 mbar
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Maximum Operating Conditions10 - 40°C, 80% RH (non condensing)
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Electronics Weight on Flange1.7 kg
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Power24 VDC, 2A external universal voltage supply (included)
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Data Acquisition MethodDedicated realtime acquisition processor
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Data Acquisition Speed<3 ms per point for analog scans
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Data Collection MethodsAnalog scanning, full mass range 8, 16 or 32 points/amu, Barchart scanning, Peak-jump collection of up to 15 peaks per scan
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Settling Time<20 ms
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Control MethodCE operating system processor with web-server interface
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Command StructureDocumented ASCII command protocols
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Electron Energy & Emission Current40 or 70 eV fixed (set in web configuration), 1 mA
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Filament ProtectionOpto-isolated input for filament protect or control with auto detection of presence of the jack plug as failsafe
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Communication10/100 Base-T Ethernet, static or automatically assigned IP addresses
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ComplianceCE
Resources & Downloads
Drawings & CADs
- e-Vision 2 Dimmensional Drawing (476.4 kB, PDF)
Literature
- e-Vision 2 General Purpose Residual Gas Analyzer (RGA) (409.8 kB, PDF)
Residual Gas Analyzer, 1-200 amu, Multichannel Plate Dual Detector, Open Ion Source, Tungsten Filaments
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