The 300mm Resist-Torr® XD incorporates V-lens™ technology advancing the proven performance of the 300mm Resist-Torr® system to a new level of sensitivity, selectivity, and confidence in degas applications, compared with conventional quadrupole mass spectrometry-based residual gas analyzers. The patented V-lens™ design provides significantly improved detection power for the most challenging wafer degas applications, where low ppb detection of contaminants and photoresist is required (<15ppb specified with Argon or Nitrogen). With V-lens™ technology, the 300mm Resist-Torr XD overcomes the issues presented by challenging gases such as Argon that the limited detection power of conventional systems cannot address. In combination with the unique PR Index from MKS, this uniquely powerful platform delivers a clear advantage for the monitoring and detection of trace gases. Process engineers are able to identify costly wafer contamination earlier and maximize process yield.