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The success of ion implantation processes is heavily dependent on the quality of the vacuum within ion implanters. As a consequence, most of MKS's product lines associated with high vacuum applications in vacuum generation, control and monitoring are of relevance in the ion implant market. Please see Vacuum Pressure Basics, Creating a Vacuum, Vacuum Measurement, and Vacuum Pressure Control for additional information. The ASTRON® Paragon® remote plasma generators can be used for F* generation in cleaning applications for ion sources and beamlines.
Front-end Semiconductor
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