For cleaning CVD and ALD/ALE process chambers, the Paragon remote plasma source is designed for high gas dissociation rates (> 98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. This leading-edge performance translates into increased process throughput and repeatable process results. The Paragon design incorporates a proprietary plasma block design with a Plasma Electrolytic Oxidation coating for low particle, long block life that delivers lower cost of ownership.
The Paragon remote plasma source is available with both analog and EtherCAT® communication ports. EtherCAT can be used for direct control of the Paragon, or in combination with the analog port, as a data monitoring port only. The Paragon streams intelligent data sets to the tool or fab database to monitor or modify operating parameters to keep process tools running at peak efficiency and to support diagnostics (APC, FDC) applications.