MKS' LIQUOZON® DI-O3 is a dissolved ozone gas delivery system providing high purity ozone in ultrapure water for Semiconductor and Electronic Thin Film applications like contaminant removal and surface conditioning via wet clean or rinsing methods. The high redox potential of ozone causes rapid conversion back to oxygen making it an environmentally friendly alternative to other chemical processes.
The DI-O3 system has user controllable and configurable dissolved ozone concentration and flow rates, meeting specific requirements for a wide range of applications. The modular and versatile mechanical system interface makes it easy to integrate and service in today's equipment facilities and meets the latest safety and monitoring requirements.
Reliability & Maintenance
Specified achievable dissolved ozone concentration in UPW for a system pressure of 2.5 barg, a cooling water temperature and UPW temperature of 20°C. At higher UPW temperatures, lower system pressure or higher cooling water temperature, the maximum performance will decrease.
|DI-O3 Flow [L/min]||DI-O3 Concentration [ppm=mg/L]|
O2: ≥Grade 4 (purity ≥99.99%)
Dopant Gas CO2: ≥Grade 4.5 (purity ≥99.995%)
Ultra-Pure Water (UPW)
Power: 3/PE~, 200 - 208 V ±10%, 50/60 Hz, 850 - 8000 W