The LIQUOZON Stream was designed for applications requiring up to 140 lpm flow and ozone concentrations of 115 - 25 ppm such as wet wafer cleaning, contaminant removal, surface conditioning, water mark removal and oxide growth. Several versions are available to suit special requirements, including an integrated booster pump for low pressure UPW supply, media connections from bottom or lower rear side, and more.
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The specified maximum achievable ozone-in-water concentration of the LIQUOZON Stream depends on the DIO3 flow rate. The specifications refer to a UPW temperature of 20°C. At higher UPW temperatures or at a lower system pressure, the maximum performance will decrease. The internal closed loop control allows for a fast and precise adjustment of the O3 output concentration.
The LIQUOZON Stream is designed to deliver a stable O3 -in-water concentration under constant controlled pressure even for varying DIO3 demands. Several different models of the LIQUOZON Stream are available to suit the required performance.
The ozone gas is generated by an integrated ozone generator based on the SEMOZON AX technology through partial conversion of oxygen O2 into O3 . The transfer of O3 from the gas phase into the de-ionized water is accomplished by special MKS designed ozone contactors. The residual O3 gas is converted back to O2 in the integrated ozone gas destruct unit.
Optionally a booster pump at the UPW inlet can be integrated to lower the necessary inlet pressure. The ozone generator incorporates an inlet for O2 gas and an outlet for the O2 /O3 mixture. CO2 is added to the O2 gas as a dopant to stabilize the ozone generation performance, as well as to stabilize ozone in the de-ionized water.