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Description
   J1 Vacuum Isolation Valve, Jalapeno, Heated, Single-stage

Specifications

  • Type
    Heated Vacuum Isolation Valve
  • Vacuum Range
    Atmosphere to below 10-9 Torr
  • Body Configuration
    Angle or Inline
  • Port Size
    NW50, NW80, NW100
  • Helium Leak Rate
    Less than 1.0 x 10-9 std cc/sec
  • Actuation
    Pneumatic
  • Cylinder Air Pressure
    60 to 100 psig
  • Limit Switch Rating
    5A - 250VAC
  • Single Pole, Single Throw
    5A - 30VDC
  • Heater Nominal Set Point
    150°C (302°F)
  • Heater Interior Range
    130°-190°C (266°-374°F)
  • Heater Materials
    Molded silicone foam, fiberglass reinforced silicone, Teflon insulated wire
  • Heater Exterior Range
    60°- 70°C (140°-158°F)
  • Heater Compliance
    CE, UL E52951 2JR, SEMI S9-95

Features

New Improved Heater Design

  • Tighter temperature control enabled by microprocessor controlled thermocouple
  • Improved reliability of heater control system due to no-arc relay circuit
  • Improved temperature uniformity with optimized design of multiple heating zones
  • Improved heater lifetimes and ease of installation with new clam-shell design of heaters
  • Improved design of thermal fuse, eliminating nuisance failures caused by transient thermal spikes
  • Special temperature settings available on request

Improved Process Performance - Yield, Uptime

  • Isolates pump lines and traps downstream
  • Reduces particle generation with slow pump downs
  • Stops unwanted sublimation of process by-products, heaters keep valve clean
  • Reported increase in time between maintenance cycles from 2 weeks to 12 weeks or 20 runs to 145 runs

Enhanced Heater Safety

  • Outside temperature of heater 45-65°C, safe to touch
  • Integral thermal fuse
  • Ground Fault Equipment Leakage Circuit Interrupter power cord option eliminates shock hazard

Better Thermal Performance

  • Reduced power consumption
  • Improved temperature uniformity, prevents cold zones
  • Patented design retains heat and improves thermal safety

Valve Features

  • Formed bellows for reduced particle buildup and longer cycle life
  • Heavy duty spring allows the valve to seal with contamination
  • Second stage allows for soft pump down
  • Adjustable orifice allows for controlled pump down
  • Thumbscrew and micrometer actuators available for bypass valve
  • Three stage valves available on request

Other Important Features

  • May be used in vacuum forelines, or the exhaust side of the pump
  • Fast delivery of standard heaters
  • Controller LED confirms that the heater is operating properly and at pre-set operating temperatures
  • Low temperature alert option warns when heater is cold
  • Specially designed valves with heaters available

Five Different Heat Zones

The heated valves may have up to five different heat zones in the heater controlled by a microprocessor based electronic controller. This eliminates “cold zones” and maintains temperature uniformity in the valve. Minimum temperatures exceed 135°C (see Figure). The valve uses a formed bellows made of 321 stainless steel. Formed bellows are easier to heat and prevent particle entrapment between the convolutions. This increases the valve cycle life.

Temperature Profile of a 46 Series NW 100 Single Stage Jalapeno Valve Heater

Safe to Touch

MKS Heaters use a patented insulation construction that is effective at maintaining heat levels required while remaining safe to touch on the outside. When you touch the outside insulation, your finger acts as a heat sink. The insulation is so effective that the outside temperature of the heater where you are touching falls to 39°C. So the heaters are safe to touch. When you remove your finger, the silicone goes back to 65°C.

Applications

Semiconductor CVD and etch processes produce gaseous by-products that can readily be pumped out of the reaction chamber. However, they usually solidify in a vacuum pump line since the line temperature is lower than the reaction chamber. A clogged line means longer down time and lower product yield.

A common process is LPCVD silicon nitride. Since sublimation is temperature driven, use heat to maintain the by-products in the vapor phase and use cooling to intentionally sublimate the vapors in the trap.

Heaters have been used successfully in tungsten and oxide etch systems. Heating helps in TEOS CVD systems where a very tight temperature control is required. Some processes yield unintentional by-products. For example, diammonium hexaflurosilicate (NH4)2SiF6 has been observed in a silicon nitride PECVD process due to the cross chemical reaction of the products formed in the deposition and etching processes. It is a sublimable material that lends itself to heating and cooling strategies. Please consult MKS application engineers for further assistance.

Resources

Literature
Manuals

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