DELTA™ II Stretch Body Flow Ratio Controller has the same capabilities as the widely-used DELTA™ II, with significantly improved performance versus the original DELTA™ FRC. This "Stretched" version differs from the standard DELTA™ II in its mechanical interface so it "fits" the space where older DELTA™ FRCs are used without tool plumbing changes.
DELTA™ II Stretch Body 2-zone Flow Ratio Controllers are available with the following options.
|Configuration Option||Option Code|
DELTA™ II Stretch Body Flow Ratio Controller
|Channel Flow Ranges (Flow 2/Flow 1)|
|Ratio (Flow 2:Flow1)|
|DeviceNet - 5 pin microconnector||6|
|DeviceNet (DeviceNet units must select 3)||3|
|Ratio: Q2 / Q1 or Q1 / Q2||R|
|Q1 Control: Q1 / Q2 or Q1 / (Q1 +Q2 )||1|
|Q2 Control: Q2 / Q1 or Q2 / (Q1 +Q2 )||2|
|MKS will ship firmware revision current to date||21|
The DELTA II has a wider dynamic ratio control range and is more adaptive to different tool and process conditions. MKS has developed a unique patent pending ratio control algorithm enabling ratio and flow response times of less than two (2) seconds. This control algorithm also enables a twenty to one ratio control range, more than double its industry leading predecessor.
The DELTA II maintains tight ratio control while the input flow is changed. Our unique patent pending ratio control algorithm enables ratio and flow response times of less than two seconds.
Widely used in a variety of flow splitting applications such as etch, strip, and CVD, the DELTA II provides the user with the ability to distribute gas or gas mixtures to two different zones in a process chamber. Send the DELTA II a gas – or any mixture – and a ratio set point and the DELTA II will split the gas into two separate output channels automatically and precisely.
Throughput and process control have always been critical to the semiconductor device manufacturer. With the advent of 300 mm wafers and dual process chambers, new methods of control gas flow distribution have become increasingly needed. 300 mm wafer processing often requires tunable control of gas distribution across the wafer to provide better process uniformity. Dual process chambers require proper gas distribution for chamber matching from single source gas panels.
The DELTA II’s diagnostic feature allows the user to check the DELTA’s performance in-situ, lowering costs through reduced removal of “No Problem Found” devices. This feature is enabled through a web browser utility accessed through the device’s Ethernet port. This utility uses a standard web browser – no special software is required. For access, the IP address may be accessed through the devices bright LED display.
MKS introduced the first, integrated flow ratio controller, widely known as the FRC, for semiconductor and flat panel processes in 2003. Since then, much has been learned about these and other critical applications requiring flow ratio control. In 2008, MKS released its next generation ratio controller, the DELTA II, to meet those demands. However, many customers could not directly convert to the new DELTA II given its more compact footprint as compared to the FRC. The DELTA II (Stretch Body) has the same footprint and connections as the original FRC making the conversion possible while also providing the DELTA II’s enhanced features, performance and reliability