Compare Model Drawings, CAD & Specs Availability Price
chemical downstream plasma source
Chemical Plasma Source, 3 kW, Quartz
chemical downstream plasma source
Chemical Plasma Source, 3 kW, Sapphire
chemical downstream plasma source
Plasma Source Tube Assembly, Quartz, AX7610
chemical downstream plasma source
Plasma Source Tube Assembly, Sapphire, AX7610


  • Type
    AX7610 Downstream Plasma Source
  • Maximum Power
    3.0 kW
  • Electrical Requirements for UV Lamp
    24 VDC, 1.0 Amp
  • Cooling
    Water (3/8 in. Swagelok® fitting) 0.35 gpm, 30°C Max at 30psid minimum
  • Gas Line Connection
    1/4 or 3/8 inch VCR®
  • Output Flange
    KF40, KF50 or custom
  • Process Gas Supply
    Quartz Tube: O2, N2, H2O, Ar, non-fluorine based gases and perating pressure 1 to 8 Torr typical
    Sapphire Tube: O2, N2, H2O, Ar, NF3, CF4, C2F6, and other Fluorine-based gases and operating pressure 2 to 8 Torr typical
  • Dimensions
    15.3 in (388 mm) Long
  • Weight
    10 lb. (4.5 kg)


Conductively Cooled Design

The patented conductively cooled design of the plasma tube supports high throughput and high power (up to 3kW) operation. The wide process window allows for AX7610 use in multiple applications, ranging from fast PR and polymer removal from 300mm wafers to fine-control low-k or atomic layer CVD processes.

Microwave Plasma Systems

The AX7610 Source is designed to be used as a part of MKS microwave plasma system, including microwave power generator, waveguide components, and the advanced SmartMatch® intelligent matching unit.

The AX7610 can be offered in custom configurations, including different vacuum and waveguide interfaces, allowing for easy integration on customer chambers and application-specific performance optimization. MKS engineering and applications group will work with the customer to determine the optimum configuration.

Block Diagram of typical Microwave Plasma Subsystem


The AX7610 has a wide operating range in terms of both pressure and power, making it suitable for a wide variety of reactive gas applications including strip and passivation, chamber cleaning, and surface modification applications.

The AX7610 has been tested with a wide spectrum of process gases including O2, N2, H2, NH3, NF3, CF4, H2O, He, and Ar. The unit includes a plasma detection unit to interface with tool I/O and is fitted with a UV lamp for reliable plasma ignition. With an installed base of over 1000 units, MTBF exceeds 100,000 hours.

The AX7610 performance in customer-specific applications can be verified in the MKS state-of-the-art plasma lab.

Ignition and tuning performance at various pressures and flows using a 3 kW SmartPower™ generator

SmartPower™ System Performance

SmartPower system performance with 50% NH3 / 50% N2 plasma at 3kW

Relative Strip Rates

Relative strip rates for quartz applicator with oxygen plasma, compared to 7slm flow @ 2 kW

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