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Granville-Phillips® 835 Differential Pump System
Overview
The Differential Pump System by Granville-Phillips® extends the vacuum pressure range of the award-winning, high performance Vacuum Quality Monitor (VQM™) to address the needs of process monitoring and process control applications at pressures up to 3 Torr. All the benefits of the VQM, including speed and ease of use, can now be used to optimize PVD, ion implant, coating, and other vacuum processes to increase productivity, improve results, and save money.
- Operation from 3 Torr to 5x10-9 Torr
- 1-145 amu partial pressure measurement in 85 ms, 1-300 amu available
- Instant information on the 10 most prevalent gases including trend graphs
- Accurate hydrogen and helium measurements (no zero blast)
- Data logging at 85 ms sample rates
- Easy single-gas calibration using a gas already in your vacuum system
Products
| Compare | Model | Drawings, CAD & Specs | Availability | Price | |||
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Differential Pumping System, Orifice 3, 90 - 3000 mTorr, Manual, 1 - 145 amu
$24,045
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835901-DP-1M1-1 Differential Pumping System, Orifice 3, 90 - 3000 mTorr, Manual, 1 - 145 amu | $24,045 |
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Differential Pumping System, Orifice 2, 9 - 350 mTorr, Pneumatic, 1 - 145 amu
$25,830
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835901-DP-2P1-1 Differential Pumping System, Orifice 2, 9 - 350 mTorr, Pneumatic, 1 - 145 amu | $25,830 |
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Differential Pumping System, Orifice 3, 1 - 45 mTorr, Manual, 1 - 145 amu
$24,045
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835901-DP-3M1-1 Differential Pumping System, Orifice 3, 1 - 45 mTorr, Manual, 1 - 145 amu | $24,045 |
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Differential Pumping System, Orifice 3, 1 - 45 mTorr, Manual, 1 - 300 amu
$26,355
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835901-DP-3M3-1 Differential Pumping System, Orifice 3, 1 - 45 mTorr, Manual, 1 - 300 amu | $26,355 |
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Specifications
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Mass Range1 to 145 amu or 1 to 300 amu
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Operating Temperature5°C to 40°C (41°F to 104°F)
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Weight10.88 Kg (24 pounds) plus the weight of the gate valve
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Pressure Range3 Torr to 10-5 Torr through orifice, to 5x10-9 Torr through bypass gate valve
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Resolution120 Full Width Half Maximum (FWHM), 180 resolution for the 300 amu system
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Response Time85 ms (1–145 amu) or 120 ms (1-300 amu)
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Dynamic Range2 decades for single scan, 3 or more with averaging
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Exposed Materials304L Stainless Steel, 316L Stainless Steel, Alumina Ceramic, Al2O3 98% Min., Nickel, Molybdenum, Ag/Cu eutectic braze, Gold, Iridium, Yttria, Y2O3 99.95%, Lead Glass (multiplier body), Chromium, Viton, Copper
Features
Differential Pumping Operation
Standard VQM Differential Pump System Setup
A pressure differential between the vacuum chamber and the VQM gauge is achieved by limiting the conductance to the sensor using an orifice in the gate valve and pumping the sensor with a turbo pump. The orifice size is specified based on the pressure in the vacuum chamber. The bypass gate valve can be opened during base out if the chamber is below 10-5 Torr. If base out is above 1x10-5 Torr, the bypass valve is not needed. The bypass valve can be controlled manually or electronically. An optional isolation valve can be used to isolate the entire differentially pumped system from your vacuum chamber when venting the chamber or when gas analysis is not needed.
The 835 DPS complete system includes the following components:
- 835 VQM Partial Pressure Gauge
- 390802 Micro-Ion Total Pressure Gauge
- Bypass Gate Valve with Orifice
- Turbo Pump
- Roughing Pump with Hose
- Interconnect Cables
- VQM Controller
- VQM Viewer Software
Vacuum Quality Monitor Theory of Operation
Autoresonant ion trap mass spectrometer technology represents an entirely new way of mass selectively ejecting ions from an electrostatic ion trap. The 835 VQM mass spectrometer gauge is natively a ratiometric measurement device that provides detailed compositional analysis of a gas mixture. The ionizer is a filament assembly that generates ions directly inside the ion trap through electron impact ionization. An electrostatic field traps the ions, and they oscillate at their natural frequency within the ion trap. The frequency of oscillation is inversely proportional to the square root of their mass-to-charge ratio. The ions are ejected through an autoresonant energy pumping process using a low amplitude RF scan. An electron multiplier collects the ejected ions and produces a current proportional to the ion concentration.
VQM® Viewer Software Highlights
- Intuitive graphical user interface
- Displays the top 10 gases in the vacuum chamber
- Single gas calibration
- Mass spectrum output
- Pressure vs. time trend display
- Leak detection with graphic display
- DSP for noise reduction and peak finding
- Logging of data
- Advanced settings and tuning functions
- Built-in contextual help files
Pressure Ranges
Operating pressure range is determined by the orifice size selected.
Resources
Literature
- 835 VQM Differential Pump System (248.5 kB, PDF)
- Vacuum Measurement Product Guide (711.5 kB, PDF)
- 835 Vacuum Quality Monitor System Datasheet (367.1 kB, PDF)
Manuals
- 835 VQM® Differential Pumping System Manual (1.2 MB, PDF)
Ultra-High Velocity