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1640a metal-sealed pressure-based 2-50 sccm mass flow controller
1640A
Mass Flow Controller, Metal-sealed, Pressure-based, 2 - 20 sccm
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 1640A Mass Flow Controller, Metal-sealed, Pressure-based, 2 - 20 sccm
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Specifications

  • Type
    Pressure-based Mass Flow Controller
  • Full Scale Flow Range
    2-20 sccm (SDS materials)
    10-1000 sccm (other materials)
    (N2 equivalent)
  • Maximum Inlet Pressure
    5 psig
  • Control Range
    5% to 100% of Full Scale
  • Typical Accuracy
    Gas/flow rate dependent
  • Repeatability
    ± 0.2% of Full Scale
  • Resolution
    0.1% of Full Scale
  • Zero Temperature Coefficient
    <0.02% of Full Scale/°C
  • Span Temperature Coefficient
    <0.2% of Rdg./°C
  • Warm-up Time
    30 minutes
  • Typical Settling Time
    <5 sec
  • Operating Temperature
    0° to 50°C
  • Power Requirements
    ± 15 VDC (± 5%) @ 200 mA
  • Set Point Command Signal
    0 to 5 VDC from <20K Ω
  • Flow Input Output Signal
    0 to 5 VDC into >10K Ω
  • Wetted Materials
    316L S.S., nickel, Inconel®
  • Valve Seat Material
    Kel-F®, Chemraz® or Kalrez®
  • External Leak Integrity
    <1 x 10-9
  • Leak Integrity Through Closed Valve
    1% of Full Scale (nitrogen) at 15 psig inlet to atmosphere
  • Fitting Type
    Swagelok® 4 VCR®
  • Compliance
    CE

Features

Designed for Safe Delivery System (SDS®) Applications

The 1640 was the first MFC to enable SDS gas utilization at source pressures below 10 Torr. Configurations of the 1640 have been designed specifically for the requirements needed for flow control in ion implanters utilizing SDS dopant sources. The SDS source pressure is typically at 650 Torr when the source is full, and drops as the source gas is extracted. The 1640 PMFC is designed to extract gas below source pressures of 10 Torr. The 1640 PMFC thus improves source utilization and reduces the frequency of source bottle changes.

The 1640 for SDS applications is designed to function over the wide SDS source pressure range from 650 Torr to below 10 Torr and provide Full Scale dopant flows as high as 10 sccm. Since flow is controlled by controlling pressure there is not as much pressure coefficient effect as there is with most thermal MFCs. The 1640 is in use today on medium and high current as well as high energy implanters throughout the world. 1640s are also available for high pressure implant gases.

Robust Pressure Based Mass Flow Control

In the 1640, a Baratron® capacitance manometer monitors the pressure upstream of the critical orifice. This pressure is proportional to mass flow. The measured pressure is compared in the control electronics to the flow set point. A control signal is then generated to drive the proportional control valve to the conductance required to bring the actual control pressure (flow) into agreement with the flow set point.

Resources

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