Our heated trap prevents coating and eventual clogging of chamber exhaust lines. When the precursors leave the chamber during Atomic Layer Deposition (ALD) they can condense and clog exhaust lines. The heated trap is designed to reduce organometallic precursors to the metal and an organic gas which passes easily through the exhaust system.
Heated ALD Process Traps
Our heated trap prevents coating and eventual clogging of chamber exhaust lines. When the precursors leave the chamber during Atomic Layer Deposition (ALD) they can condense and clog exhaust lines. The heated trap is designed to reduce organometallic precursors to the metal and an organic gas which passes easily through the exhaust system.
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Ultra-High Velocity